Ruthenium( ii ) carbonyl amidates – a new class of precursors for atomic layer deposition

Dalton Transactions 2026 Open access

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Authors: Jorit Obenlüneschloß, Cara‐Lena Nies, Michael Gock, Michael A. Unkrig‐Bau, Niklas Huster, Michael Nolan, Anjana Devi
DOI: 10.1039/d5dt02610e
Cited by: 0
References: 51

Abstract

], as a volatile liquid precursor with excellent thermal properties. First principles simulations predict favorable interactions with common ALD co-reactants, indicating its potential for thin film deposition.

Fields of Study & Subjects

Semiconductor materials and devices Copper Interconnects and Reliability Synthesis and characterization of novel inorganic/organometallic compounds

Publication details

Journal / source
Dalton Transactions
Volume
55
Issue
10
Pages
4046–4050
Publication date
1 January 2026
Language
EN