Aqueous HF–HBrO 4 solutions for wet-chemical etching of (100) silicon wafer surfaces

Materials Advances 2026 Open access

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Authors: N. Schubert, Niklas Zomack, André Stapf, Patrick A. Fuzon, Ann‐Lucia Neumann, Dominic Walter, Andreas Lissner, Florian Kraus, Edwin Kroke
DOI: 10.1039/d5ma01429h
Cited by: 2
References: 53

Abstract

The etching behavior of silicon (Si) in aqueous solutions of hydrofluoric acid (HF) and perbromic acid (HBrO 4 ) is investigated to expand the understanding of the dissolution mechanism of Si in halogen containing acidic etching solutions.

Fields of Study & Subjects

Silicon and Solar Cell Technologies Semiconductor materials and devices Silicon Nanostructures and Photoluminescence

Publication details

Journal / source
Materials Advances
Publisher
Royal Society of Chemistry (RSC)
Volume
7
Issue
6
Pages
3315–3327
Publication date
1 January 2026
Language
EN