Author response for "Aqueous HF-HBrO 4 Solutions for Wet-Chemical Etching of (100) Silicon Wafer Surfaces"

Publons reviews and discussion 2026

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Authors: N. Schubert, Niklas Zomack, André Stapf, Patrick A. Fuzon, Ann‐Lucia Neumann, Dominic Walter, Andreas Lißner, Florian Kraus, Edwin Kroke

DOI: 10.1039/d5ma01429h/v2/response1

Cited by: 0

Fields of Study & Subjects

Semiconductor materials and devices Plasma Diagnostics and Applications Laser Material Processing Techniques