Review for "Recent Progress in HfO₂-Based Ferroelectric Devices with Oxide Semiconductor Channels: A Comprehensive Review"

Publons reviews and discussion 2026

View at publisher

DOI: 10.1039/d5na00980d/v2/review2

Cited by: 0

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Multiferroics and related materials