Classification, performance and recycling of ceria-based materials used for chemical mechanical polishing
Abstract
characterization (AFM, XPS) and DFT-ML coupled calculations to deepen multi-scale mechanism research, achieving intelligent process optimization based on machine learning, and developing specialized abrasives for third-generation semiconductors and optical crystals, thereby promoting large-scale and environmentally friendly applications in high-end manufacturing.
Fields of Study & Subjects
Advanced Surface Polishing Techniques
Catalytic Processes in Materials Science
Aerogels and thermal insulation
Publication details
- Journal / source
- Nanoscale
- Publisher
- Royal Society of Chemistry (RSC)
- Volume
- 18
- Issue
- 11
- Pages
- 5638–5666
- Publication date
- 1 January 2026
- Language
- EN