Performance and stability evaluation of LaF 3 thin-film waveplates for high-power 266 nm laser applications

Nanoscale 2026

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Authors: Darija Astrauskytė, Mantas Slipkauskas, Saulius Tumėnas, Aušra Selskiene, Lukas Ramalis, Lina Grinevičiūtė
DOI: 10.1039/d5nr04985g
Cited by: 1
References: 40

Abstract

Thin-film LaF 3 waveplates exhibit superior stability and low retardance drift under changing humidity compared with all-SiO 2 waveplates, supporting reliable high-power laser operation at a 266 nm wavelength.

Fields of Study & Subjects

Optical Coatings and Gratings Solid State Laser Technologies Magneto-Optical Properties and Applications

Publication details

Journal / source
Nanoscale
Publisher
Royal Society of Chemistry (RSC)
Volume
18
Issue
8
Pages
4127–4134
Publication date
1 January 2026
Language
EN