Novel chemical mechanical polishing assisted by photocatalysis and shear-thickening for a free surface blade of a Ti alloy using ceria nano-abrasives
Abstract
and MRR are the best published to date for a Ti alloy blade with a free surface. PSTCMP mechanisms were interpreted using first-principles molecular dynamics, X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. Hydroxyl radicals were generated under ultraviolet irradiation on ceria with a size of 4.2 nm, oxidizing the surface of the Ti alloy and forming Ti-OH and Ti-O groups. A Ce-O-Ti interface bridge was produced between Ti-OH and Ce-OH, induced by the hydrolysis of ceria. Our findings provide a new way to fabricate nanometer-scale surface roughness on a free surface blade of a Ti alloy with a high MRR.
Fields of Study & Subjects
Advanced Surface Polishing Techniques
Advanced machining processes and optimization
Advanced materials and composites
Publication details
- Journal / source
- Nanoscale
- Publisher
- Royal Society of Chemistry (RSC)
- Volume
- 18
- Issue
- 9
- Pages
- 4720–4737
- Publication date
- 1 January 2026
- Language
- EN