Synthesis of heteroleptic [Sr(ddemap)(tmhd)] 2 and its use in atomic layer deposition of low carbon SrO thin films

RSC Advances 2026 Open access

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Authors: Y. S. Lee, Chanwoo Park, sangyeon Jeong, Daeun Lim, Jong-Hyun Kim, Hyeongjun Kim, Eun A. Kim, Seong-Yong Cho, Hyobin Yoo, Bo Keun Park, Teak-Mo Chung, Woongkyu Lee
DOI: 10.1039/d5ra08373g
Cited by: 1
References: 38

Abstract

New heteroleptic Sr complexes were synthesized and evaluated as ALD precursors. [Sr(ddemap)(tmhd)] 2 enabled self-limited SrO growth at 370 °C with O 3 . Al 2 O 3 capping effectively suppressed carbonate formation, yielding smooth, high-purity SrO films.

Fields of Study & Subjects

Semiconductor materials and devices Electronic and Structural Properties of Oxides Copper Interconnects and Reliability

Publication details

Journal / source
RSC Advances
Publisher
Royal Society of Chemistry (RSC)
Volume
16
Issue
6
Pages
4740–4749
Publication date
1 January 2026
Language
EN