High-resolution direct laser writing nanolithography enabled by oxidation-mediated corrosion selectivity in N-doped Sb heat-mode resists
Abstract
The NSb thin film is proposed as a positive-tone resist suitable for direct laser writing and dry etching, offering a developing selectivity of 6.1 and a Si-to-NSb selectivity of 34.0. Features of 60 nm are patterned with a period of 160 nm.
Fields of Study & Subjects
Nonlinear Optical Materials Studies
Nanofabrication and Lithography Techniques
Laser Material Processing Techniques
Publication details
- Journal / source
- Journal of Materials Chemistry C
- Volume
- 14
- Issue
- 10
- Pages
- 3941–3953
- Publication date
- 1 January 2026
- Language
- EN