Recent advances in design and preparation of abrasives for chemical mechanical polishing of hard-brittle materials

Journal of Materials Chemistry C 2026

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Authors: Qing Ma, Xinhuan Niu, Jiakai Zhou, Ziliang Liu, Mengqi Wang, Shaobo Song, Zheng Wu, Bin Hu, Jin Li, Jiao Hong
DOI: 10.1039/d5tc04531b
Cited by: 3
References: 139

Abstract

This review summarizes CMP abrasive design, properties, removal mechanisms, optimization, applications, challenges, and future directions for balancing removal rate and surface quality in ultra-precise processing of hard-brittle materials.

Fields of Study & Subjects

Advanced Surface Polishing Techniques Diamond and Carbon-based Materials Research Adsorption diffusion and thermodynamic properties of materials

Publication details

Journal / source
Journal of Materials Chemistry C
Publisher
Royal Society of Chemistry (RSC)
Volume
14
Issue
11
Pages
4248–4280
Publication date
1 January 2026
Language
EN