A progressive photocuring approach: a macrocyclic photoinitiator enabling exceptional toughness in thick poly(TMPTA) coatings

Polymer Chemistry 2026

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Authors: B. H. Chen, Xinyang Zhao, Yifan Simon Liu, Xiangqi Xu, Luran Chun, Zhouju Zhong, Jun Nie, Jingfang Li
DOI: 10.1039/d6py00038j
Cited by: 1
References: 34

Abstract

Achieving thick coatings (>200 μm) remains a significant challenge in the field of photopolymerization, primarily due to light attenuation.

Fields of Study & Subjects

Photopolymerization techniques and applications Synthesis and properties of polymers Nanofabrication and Lithography Techniques

Publication details

Journal / source
Polymer Chemistry
Publisher
Royal Society of Chemistry (RSC)
Volume
17
Issue
13
Pages
1308–1321
Publication date
1 January 2026
Language
EN