Aliovalent gallium dopants remove Ti 3+ defects and improve photocatalytic and photoelectrochemical water oxidation properties of LaTiO 2 N

Journal of Materials Chemistry A 2026

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Authors: Li Wang, Rajesh Kandel, Mahya Salmanion, Guodong Rao, William F. Hahn, Zainab Najaf, Klaus van Benthem, R. David Britt, Frank E. Osterloh
DOI: 10.1039/d6ta00050a
Cited by: 2
References: 84

Abstract

Ti 3+ recombination defects in LaTiO 2 N can be suppressed with aliovalent gallium (Ga 3+ ) dopants, as confirmed with electron paramagnetic resonance (EPR), X-ray photoelectron, optical absorption and surface photovoltage spectroscopy.

Fields of Study & Subjects

Advanced Photocatalysis Techniques TiO2 Photocatalysis and Solar Cells Ammonia Synthesis and Nitrogen Reduction

Publication details

Journal / source
Journal of Materials Chemistry A
Publisher
Royal Society of Chemistry (RSC)
Volume
14
Issue
22
Pages
13623–13636
Publication date
1 January 2026
Language
EN