A nanoscale patterned hydrogel that’s hard to resist

Scilight 2026 Open access

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Authors: Hannah Richter
DOI: 10.1063/10.0042227
Cited by: 0

Abstract

Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Advancements in Photolithography Techniques Block Copolymer Self-Assembly

Publication details

Journal / source
Scilight
Volume
2026
Issue
2
Publication date
8 January 2026
Language
EN