Harnessing sulfur hexafluoride for clearer and more efficient plasma etching

Scilight 2026

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Authors: Alane Lim
DOI: 10.1063/10.0042430
Cited by: 0

Abstract

A parametric study reveals more sustainable etch dynamics, chromium mask selectivity, and pathways toward zero-global-warming-potential fluorine plasmas.

Fields of Study & Subjects

Plasma Diagnostics and Applications Plasma Applications and Diagnostics Advancements in Photolithography Techniques

Publication details

Journal / source
Scilight
Volume
2026
Issue
6
Publication date
5 February 2026
Language
EN