Back-barrier-induced fast transient trapping and threshold voltage instability in AlGaN/AlN/GaN HEMTs
Abstract
Fast transient charge trapping in AlGaN/AlN/GaN high-electron-mobility transistors (HEMTs) was investigated using fast pulsed measurements. Two devices—with and without an Al0.08Ga0.92N back-barrier—were compared to evaluate the threshold voltage (Vt) instability under single-pulse stress from 1 ms to 1 s. The back-barrier device exhibited a slightly larger short-term Vt shift (
Fields of Study & Subjects
GaN-based semiconductor devices and materials
Silicon Carbide Semiconductor Technologies
Semiconductor materials and devices
Publication details
- Journal / source
- AIP Advances
- Volume
- 16
- Issue
- 3
- Publication date
- 1 March 2026
- Language
- EN