Insights into the Combined Influence of Electron Beam Focus and Sample Temperature on Linewidth Measurements
Abstract
This study investigates the impact of the sample’s intrinsic temperature on the line-scan profile of a silicon trapezoidal structure by employing Monte Carlo simulations with a focusing electron beam. This study first reveals that for a specific trapezoidal line, the line-profile contrast increases with temperature across varying focus depths due to the extra energy gain by electrons from the sample. In addition, the optimal focus depth, associated with minimal bias, decreases as temperature rises. This study demonstrates strong potential to provide valuable insights into linewidth measurement techniques for nanostructures using scanning electron microscopes under more realistic environmental conditions.
Fields of Study & Subjects
Electron and X-Ray Spectroscopy Techniques
Advancements in Photolithography Techniques
Advanced Electron Microscopy Techniques and Applications
Publication details
- Journal / source
- Journal of Computational and Theoretical Transport
- Volume
- 55
- Issue
- 2
- Pages
- 200–210
- Publication date
- 23 February 2026
- Language
- EN