Robust Floquet-Induced Gap in Irradiated Graphite

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Authors: Fei Wang, Xuanxi Cai, Wanying Chen, Jiangbo Lu, Tianshuang Sheng, X. Tang, J. Li, Hongyun Zhang, Shuyun Zhou
Cited by: 3
References: 42

Abstract

Abstract Floquet engineering provides an emerging pathway for tailoring the electronic states of quantum materials through time-periodic drive. A critical step along this direction is achieving light-induced modifications of the dynamical electronic structure, such as avoided-crossing gap at the Floquet Brillouin zone boundary, via efficient coupling of electrons with the coherent light-field. Here, we report robust Floquet-induced gap in bulk graphite that persists despite the presence of interlayer coupling and photo-excitation. Using time- and angle-resolved photoemission spectroscopy with intense mid-infrared pumping, we directly reveal Floquet-induced gaps at resonance points both in the valence and conduction bands, accompanied by coherent Floquet sidebands. The gap and sidebands coexist with photo-excited carriers, yet their distinct timescales allow us to disentangle their origins. Our demonstration of robust Floquet-induced gaps establishes graphite as a platform for coherent manipulation of Dirac fermions and realization of light-engineered quantum phases.

Fields of Study & Subjects

Graphene research and applications Topological Materials and Phenomena Surface and Thin Film Phenomena

Publication details

Journal / source
Chinese Physics Letters
Publisher
IOP Publishing
Volume
43
Issue
5
Pages
050705–050705
Publication date
30 March 2026