Thermalization of rubidium atoms scattered from a low-temperature paraffin film
Abstract
Abstract With an objective to explore the surface interaction between alkali-metal atoms and an inert organic coating, we used an atomic beam to measure the velocity distribution of gaseous rubidium atoms scattered from a low-temperature tetracontane film. When the film temperature decreased from 300 K to 200 K, the number of scattered atoms did not change. At below 200 K, the number began to decrease until, finally, no scattered atoms were observable at 140 K. X-ray photoelectron spectroscopy at 160 K or below revealed rubidium atoms on the film surface. The temperature of the scattered atoms was the same as that of the film. Thermalization of scattered atoms at room temperature was reported previously, but this study is the first to report thermalization at low temperatures.
Fields of Study & Subjects
Cold Atom Physics and Bose-Einstein Condensates
Gas Dynamics and Kinetic Theory
Ion-surface interactions and analysis
Publication details
- Journal / source
- Journal of Physics B Atomic Molecular and Optical Physics
- Volume
- 59
- Issue
- 4
- Pages
- 045202–045202
- Publication date
- 9 February 2026
- Language
- EN