Generation of homogeneous removal profile by sample rotation using a broad beam ion source

Abstract Ion beam etching processes play a central role in the process chain for manufacturing high-performance optical systems. These techniques are a necessary final processing step to reach a small shape deviation and roughness values below 0.1 nm. They are also a central processing step in the production of diffractive or refractive optics. Looking at these fields a clear trend towards sample diameters larger than 400 mm is visible. Since the diameter of the tool is much smaller compared to the size of the sample, a suitable motion strategy has to be found. This work presents and discusses a method for processing large-diameter samples while simultaneously minimizing the size of the processing machine system. A mathematical background is given and the simulation results are experimentally verified.