Investigation of a gate-series-diode structure for improving Schottky-type p-GaN gate reliability

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Authors: Xuejing Sun, Shenglei Zhao, Longyang Yu, Longyang Yu, Juan Gui, Ga Zhang, Song Lin Yang, Shuzhen You, Song Lin Yang, Huantao Duan, Bin Hu, Huantao Duan
+4 more Jin Rao, Zhen Chen, Yue Hao, Jincheng Zhang
Cited by: 0
References: 23

Abstract

Abstract In this paper, a novel gate-series-diode structure for the Schottky-type p-GaN HEMTs is proposed, and the impact of the proposed structure on gate−source voltage oscillation is investigated when the device is turned on. The proposed structure is capable of effectively mitigating the gate−source voltage overshoot problem of GaN device, and has little effect on the switching characteristics. The gate voltage oscillations can be greatly stabilized at the steady-state turn-on voltage level when the turn-on voltage is 5 V. Compared with the conventional structure, the overshoots of the proposed structure reduce by 31.4%−71.4% and 40.6%−80.4% respectively under the two pulses, as drain−source voltage rises. The proposed structure is proved to be a potential method on improving gate reliability of the most GaN power devices.

Fields of Study & Subjects

Semiconductor materials and devices Advancements in Semiconductor Devices and Circuit Design Semiconductor materials and interfaces

Publication details

Journal / source
Journal of Semiconductors
Publisher
IOP Publishing
Volume
47
Issue
5
Pages
052503–052503
Publication date
1 May 2026
Language
EN