First Demonstration of Stitching-Free Exposure over an Ultra-Large 18-Reticle Area with High-Resolution 1.5μm Line/Space on Glass Substrates

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Authors: Naoya Sohara, Toshimitsu Arai, Ryotaro Takahashi, Naoki Goto, Hirosuke Takamatsu
Cited by: 2
References: 6

Publication details

Journal / source
2026 IEEE 76th Electronic Components and Technology Conference (ECTC)
Publisher
IEEE
Pages
1187–1190
Publication date
1 May 2026