Simultaneous Surface Reduction and Self-Passivation via Ar-CH 4 Plasma for Cu Hybrid Bonding

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Authors: Hoogwan Lee, Byeongchan Go, S Kim
Cited by: 1
References: 11

Fields of Study & Subjects

3D IC and TSV technologies Copper Interconnects and Reliability Electronic Packaging and Soldering Technologies

Publication details

Journal / source
2026 IEEE 76th Electronic Components and Technology Conference (ECTC)
Publisher
IEEE
Pages
2003–2006
Publication date
26 May 2026