14.1 THz-TSI: A 0.33pJ/b 264Gb/s Through-Silicon Interconnect Module for 3D Integration Utilizing Terahertz Coupling

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Authors: Changhua Jiang, Xiaodi Feng, X. Y. Shen, Chixiao Chen, Qi Liu, Ming Liu, Ningsheng Xu
Cited by: 1
References: 13

Abstract

A through-silicon interconnect module for 3D integration utilizing THz coupling is presented, which achieves a record high data rate of$264 ~\text{Gb} / \mathrm{s}$and efficiency of$0.33 \text{pJ} / \mathrm{b}$. Both bidirectional point-to-point link and broadcast mode are successfully demonstrated. This scheme offers highly competitive bandwidth and density with significantly simpler fabrication and lower cost. Furthermore, its high flexibility enables real-time adjustable interconnect topology to effectively reduce latency.

Fields of Study & Subjects

3D IC and TSV technologies Advancements in PLL and VCO Technologies Radio Frequency Integrated Circuit Design

Publication details

Journal / source
2026 IEEE International Solid-State Circuits Conference (ISSCC)
Publisher
IEEE
Pages
1–3
Publication date
15 February 2026