2.9-kV Enhancement-Mode GaN Monolithic Bidirectional Switch Based on Gate Post-Annealing-Free Oxygen Plasma Treatment
Fields of Study & Subjects
GaN-based semiconductor devices and materials
Silicon Carbide Semiconductor Technologies
Ga2O3 and related materials
Publication details
- Journal / source
- IEEE Electron Device Letters
- Volume
- 47
- Issue
- 4
- Pages
- 692–695
- Publication date
- 6 February 2026