AlScN-Based Ferroelectric Memcapacitor on Silicon Platform

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Authors: Wenxin Sun, Xihui Yuan, Ruiqing Wang, Hengrui Zhang, Siying Zheng, Haiwen Xu, Zhen Yuan, Jiuren Zhou, Yan Liu, Yue Hao, Genquan Han
Cited by: 0
References: 28

Abstract

We report an experimentally realized silicon-integrated AlScN-based ferroelectric memcapacitor (FMC) with a metal-ferroelectric-semiconductor (MFS) structure, whose underlying physical mechanism is elucidated through TCAD simulations. The FMC exhibits a distinct capacitance memory window (CMW) at zero bias with a stable high/low capacitance state (HCS/LCS) ratio of ~ 124%, enabling eight uniform and tightly spaced capacitance states for 3-bit storage. Furthermore, by utilizing non-destructive read operation (NDRO) to decouple read from write operations, the FMC achieves read-endurance surpassing write-endurance by > 4 orders of magnitude, with ultra-low read energy consumption of sub-fJ/μm2. This work presents a low-power wurtzite ferroelectric memory with promising potential for silicon-based large-scale memory and read-intensive applications.

Fields of Study & Subjects

Ferroelectric and Negative Capacitance Devices Semiconductor materials and devices Advanced Memory and Neural Computing

Publication details

Journal / source
IEEE Electron Device Letters
Volume
47
Issue
5
Pages
897–900
Publication date
5 March 2026
Language
EN