Boosting Performance ε -Ga 2 O 3 SAW Resonators With Mo Interlayer: Optimized Electric Field and Enhanced FOM

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Authors: Jiaqi Ding, Yao Cai, Yan Liu, Zhucheng Li, Li Zhang, Yuanhang Qu, Xiaoming Huang, Xiang Calvin Chen, Shengxiang Wang, Xiaodong Zhang, Chengliang Sun, Shishang Guo
Cited by: 1
References: 27

Abstract

This letter reports a high-performance surface acoustic wave (SAW) resonator that incorporates a Mo interlayer between sapphire substrate and$\varepsilon $-Ga2O3(002). In this design, a Mo metal layer is used as the bottom electrode, followed by the deposition of an epitaxial$\varepsilon $-Ga2O3piezoelectric film via metal-organic chemical vapor deposition (MOCVD) and subsequent etching to expose the bottom electrode. Devices with the grounded Mo electrode achieve a figure of merit (FOM = effective electromechanical coupling coefficient$k^{2}_{\mathrm {eff}} \times $quality factor$Q$) enhanced by more than 60 times (from a maximum of 3.11 to 196) compared to conventional configurations. Finite element simulations indicate that the grounding bottom electrode optimizes the electric field distribution and prevents electric field leakage into the sapphire substrate, thereby boosting the FOM of the$\varepsilon $-Ga2O3-based SAW resonator. The proposed novel$\varepsilon $-Ga2O3SAW resonator structure significantly improves device performance and greatly enhances its potential for sensor applications.

Fields of Study & Subjects

Ga2O3 and related materials GaN-based semiconductor devices and materials Acoustic Wave Resonator Technologies

Publication details

Journal / source
IEEE Microwave and Wireless Technology Letters
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Volume
36
Issue
5
Pages
709–712
Publication date
12 January 2026