Fabrication of Aperture-Tunable Silicon Nanostencil Membrane via Localized Laser Annealing
Abstract
We present a novel nanofabrication strategy that leverages localized laser annealing for deterministic aperture tuning of silicon nanostencil membranes. Through controlled contraction of lithographically defined nanoholes in the device layer of an SOI wafer, we achieve tunable pore sizes ranging from$\sim 100 \text{nm}$down to below 20 nm. This method offers a scalable and cost-effective alternative to conventional nanostencil fabrication, while enabling reusable membranes for large-area, size-controlled nanodisk array patterning.
Fields of Study & Subjects
Nanofabrication and Lithography Techniques
Advanced MEMS and NEMS Technologies
Advancements in Photolithography Techniques
Publication details
- Journal / source
- IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
- Pages
- 786–788
- Publication date
- 25 January 2026
- Language
- EN