Dry Mask Transfer Lithography: A Solution-Less Approach for Patterning Colloidal Nanomaterials

This work presents the solvent-free dry mask transfer method that enables high-resolution patterning of functional nanomaterials on chemically sensitive substrates. A pre-patterned photoresist (PR) layer is transferred from a polydimethylsiloxane (PDMS) stamp to the target substrate, excluding solvent-based lift-off. Thermal expansion mismatch between PDMS and PR lowers interfacial adhesion during heating, ensuring clean mask release. Experiments demonstrate precise PR transfer, controlled patterning of Zinc Oxide nanomaterials, and selective surface functionalization, generating localized wettability contrast. The technique provides robust pattern fidelity, minimizes cohesive fracture, and offers a scalable route for fabricating next-generation devices compatible with diverse materials.