Achieving Ultrahigh Threshold Voltage in Enhancement-Mode AlGaN/GaN HEMTs With an Al x Ti y O/p-GaN Integrated Gate Stack—Part II
Fields of Study & Subjects
GaN-based semiconductor devices and materials
Ga2O3 and related materials
Silicon Carbide Semiconductor Technologies
Publication details
- Journal / source
- IEEE Transactions on Electron Devices
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Volume
- 73
- Issue
- 3
- Pages
- 1235–1242
- Publication date
- 21 January 2026