Achieving Ultrahigh Threshold Voltage in Enhancement-Mode AlGaN/GaN HEMTs With an Al x Ti y O/p-GaN Integrated Gate Stack—Part II

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Authors: Rasik Rashid Malik, Vipin Joshi, Rajarshi Roy Chaudhuri, Anup Thakare, Mayank Shrivastava
Cited by: 1
References: 45

Fields of Study & Subjects

GaN-based semiconductor devices and materials Ga2O3 and related materials Silicon Carbide Semiconductor Technologies

Publication details

Journal / source
IEEE Transactions on Electron Devices
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Volume
73
Issue
3
Pages
1235–1242
Publication date
21 January 2026