Development of Monolithic Multi-Element Silicon Drift Detectors

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Authors: Togo Kudo, Ikuo Kurachi, Takafumi Ohmoto, Toshifumi Imamura, T. Maeda, Toshiaki Tosue, Yuji MATSUDA, Kazuo Kobayashi, Takaki Hatsui
Cited by: 1
References: 23

Abstract

In this study, a monolithic multi-element silicon drift detector (mxdCMOS) was developed utilizing the Silicon-on-Insulator (SOI) technology, specifically designed for high count-rate measurement in synchrotron radiation X-ray spectroscopy. The fabricated chip, measuring 12.4 mm × 18.5 mm, integrates 30 Silicon Drift Detector (SDD) elements, each with an area of 1.8 mm × 1.8 mm. This study successfully demonstrated that each element operates at a count rate exceeding 1 Mcps, achieving a linear response up to 30 Mcps and a saturation throughput of 75 Mcps per chip. This performance surpasses the limits of conventional single-element SDDs, which typically saturate at the 1 Mcps level, and represents one of the highest rates among existing multi-element systems. By employing digital signal processing with a short peaking time of 130 ns, an energy resolution of 170 eV (Full Width at Half Maximum at 5.9 keV) was achieved. This unprecedented count-rate capability offers significant advantages for applications requiring high-throughput, such as fluorescence-yield Quick X-ray Absorption Fine Structure (XAFS) and high-speed elemental mapping using high-brilliance synchrotron X-ray beams. The monolithic integration of the detector array and readout electronics resolves conventional issues related to external amplifier connections, such as noise and wiring capacitance.

Fields of Study & Subjects

Particle Detector Development and Performance Silicon and Solar Cell Technologies Silicon Nanostructures and Photoluminescence

Publication details

Journal / source
IEEE Transactions on Nuclear Science
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Volume
73
Issue
4
Pages
1517–1525
Publication date
24 February 2026