Direct Synthesis of Multi-Stacked Channels and Doped Source/Drains for TMD CFETs

2026 IEEE/JSAP Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) 2026

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Authors: Shinichi Tanabe, Naoya Okada, Toshifumi Irisawa, Hao Cheng, Hitoshi Miura, Hisashi Warashina, Yu-min Huang, Keiichi Nagasaka, Atsuki Fukazawa, Hiroki Maehara
DOI: 10.1109/vlsitechnologyandcir65830.2026.11577410
Cited by: 1
References: 5

Fields of Study & Subjects

Advancements in Semiconductor Devices and Circuit Design Innovative Microfluidic and Catalytic Techniques Innovation Ferroelectric and Negative Capacitance Devices

Publication details

Journal / source
2026 IEEE/JSAP Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
Publisher
IEEE
Pages
1–3
Publication date
14 June 2026