Area-dependent dielectric breakdown: an overlooked yet inevitable physical phenomenon (invited)
Abstract
Traditionally, area-dependent dielectric breakdown (BD) is understood to obey an inverse area-scaling law, where defect generation is regarded as the sole contributing factor. Most theoretical modeling approaches, including multi-scale simulations, typically regard BD as defect-induced conduction in a non-competitive context. Such methodologies often overlook the influence of defect competition, which results in area-dependent BD and the transformation of dielectrics from their pristine condition to degraded and fragmented states at BD. Recent studies [1] - [3] addressing reverse and diminishing area-scaling effects in hydrogen-doped HfO2have highlighted large discrepancies between traditional area-dependent BD interpretations and contemporary understanding [3]. In this work, we employ a physics-based statistical model to elucidate the complex mechanisms underlying BD, demonstrating how the interplay between defect annihilation and generation produces diverse BD area scaling behaviors.
Fields of Study & Subjects
Power Transformer Diagnostics and Insulation
Copper Interconnects and Reliability
Semiconductor materials and devices
Publication details
- Journal / source
- 2026 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)
- Publisher
- IEEE
- Pages
- 1–4
- Publication date
- 13 April 2026