Tabletop extreme ultraviolet test platform for optical property evaluation of lithography materials

Extreme ultraviolet (EUV) lithography, owing to its ultrashort wavelength and high photon energy, serves as a key technology in advanced semiconductor manufacturing. As its applications continue to expand, the evaluation of essential materials—such as photoresists, pellicles, and filters—has become increasingly important to ensure process reliability and performance. With growing demand for EUV material characterization, the need for accessible and versatile testing systems has become evident. In response, this study presents the development and validation of a tabletop EUV platform designed for the evaluation of material properties, including sensitivity and transmittance. To verify the platform’s performance, two demonstration experiments were conducted. First, the transmittances of Zr foils were measured, yielding values of 43.5% for plain Zr foils and 34.7% for Ni-meshed Zr foils. Second, a lithographic patterning experiment was performed in which a line-and-space (L/S) pattern was transferred onto a photoresist using EUV exposure through a transparent mask. Successful pattern transfer was confirmed through analysis using field-emission scanning electron microscopy and atomic force microscopy. This system enables efficient and reliable evaluation of EUV materials, supporting both lithographic and optical performance assessments. It is expected to serve as a practical tool for advancing research and development of EUV-compatible materials.