Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2026 Open access

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Authors: Montu P. Bhuva, Greg Daly, Geoff Hassall, James Ellis, Erik Wagenaars, James Dedrick
DOI: 10.1116/6.0005207
Cited by: 1
References: 73

Abstract

Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes.Journal of vacuum science & technology

Fields of Study & Subjects

Copper Interconnects and Reliability Semiconductor materials and devices Silicon Nanostructures and Photoluminescence

Publication details

Journal / source
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Publisher
American Vacuum Society
Volume
44
Issue
2
Publication date
11 February 2026
Language
EN