Fabrication optimization of suspended stencil mask lithography for multi-terminal Josephson junctions
Abstract
Stencil mask lithography is an advanced technique for fully in situ fabricating Josephson junctions, which is increasingly being used for multiterminal Josephson junctions. This study provides information on the optimal mask design and mask reliability. For this, 270 mask designs were systematically fabricated and investigated under a scanning electron microscope. Reliable statements are made about mask yield, minimal dimensions, and systematic dependencies on the number of superconducting terminals. We find that stencil mask lithography can be used reliably for fabricating multiterminal Josephson junctions, enabling lateral mask dimensions down to 40 nm on average.
Fields of Study & Subjects
Advanced Electrical Measurement Techniques
Physics of Superconductivity and Magnetism
Quantum Information and Cryptography
Publication details
- Journal / source
- Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
- Publisher
- American Vacuum Society
- Volume
- 44
- Issue
- 3
- Publication date
- 25 March 2026
- Language
- EN