TiOx etch challenges for AR/VR applications using TEL ICP technology

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Authors: Eitan Barlaz, Brittany Hedrick, Sheldon Meyers, David L. O'Meara, Dustin W. Janes, John Grimm, Sungho Yook, Julen Arozamena, S. Matsui, Yoshio Fukasawa, Ryan L. Burns, Sophie Thibaut
+3 more Loli Baquerizo, Julie Bannister, Takuya Higuchi
Cited by: 0

Fields of Study & Subjects

Low-Pressure Plasma Processing and Diagnostics Advancements in Photolithography Techniques Semiconductor materials and devices

Publication details

Journal / source
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR)
Pages
36–36
Publication date
5 March 2026
Language
EN