PFAS-free working stamp resin with high release performance and dimensional stability for UV nanoimprint in AR waveguide fabrication

2026

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Authors: Taigo Akasaki, Michiya Naito, Risa Tanaka, Takeshi Osaki

DOI: 10.1117/12.3076979

Cited by: 0

References: 2

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Synthesis and properties of polymers Advanced optical system design

References 2