Scalable atomic layer deposition of titanium dioxide films for high-volume manufacturing of AR waveguides

2026

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Authors: Satyajit Shinde, Bo Yin, Satoshi Onodera, Jun Ogawa, Kenji Tago, Masayuki Hasegawa, Robert Borra, Takuya Higuchi, Alejo M. Lifschitz, Nicholas Alba
DOI: 10.1117/12.3078091
Cited by: 0
References: 5

Fields of Study & Subjects

Semiconductor materials and devices Optical Coatings and Gratings Advanced Materials and Semiconductor Technologies

Publication details

Pages
74–74
Publication date
15 January 2026