Computational modeling of enhanced nonlinear optical response in plasmonic waveguide devices with epsilon-near-zero films

Silicon photonics faces fundamental limitations in nonlinear applications due to weak Kerr nonlinearity, substantial two-photon absorption, and coupling challenges with subwavelength structures. This work investigates epsilon-near-zero (ENZ) materials integrated into plasmonic waveguide architectures for enhanced nonlinear photonic devices. ENZ materials exhibit nonlinear refractive indices several orders of magnitude higher than conventional materials near their zero-permittivity wavelength, enabling giant optical effects over deeply sub-wavelength interaction lengths. We present finite element method simulations of plasmonic ENZ waveguides, investigating layer thickness optimization for nonlinear enhancement while minimizing optical losses. Initial modal analysis confirms superior field confinement in hybrid plasmonic-ENZ structures compared to conventional silicon waveguides. Resonant stub and ring configurations represent promising directions for further enhancement. Preliminary results establish design guidelines balancing field enhancement against absorption losses, providing a computational framework for ENZ-integrated photonic circuit implementation.