A low-cost, open-access two-photon lithography tool

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Authors: Soroush Shabahang, Zhenle Cao, Ashish Jain, Sabeeh Irfan Ahmad, Ekaterina Bolotskaya, Lisa Gavronskiy, Cameron Chin, Bera Yavuz, Patrick A. Sullivan, Jeffrey Costello, Jacob M. Prisament, Amos Meeks
+1 more Daniel Oran
Cited by: 0
References: 5

Abstract

Two-photon polymerization has been demonstrated to be a highly promising technology for fabricating 3D structures with sub-micron resolution for a wide variety of applications, including optics, microfluidics, mechanics, and more. Fabricating optics in particular typically requires sub-micron feature sizes and positioning. Commercially available point-scan two-photon polymerization systems typically cost hundreds of thousands of dollars, making them out of reach for most individual research groups. Here we present an initial design for a modular two-photon lithography (2PL) platform. With a total cost ranging from USD $30-150K depending on configuration, this system significantly lowers the entry barrier to two-photon fabrication. In addition to the optical and mechanical design and a complete bill of materials (BOM), we release a publicly available lithography software stack that enables arbitrary voxel-level grayscale control through simple three-dimensional NumPy matrices. The modular and extensible nature of the system allows for straightforward modification, making it suitable both as a research platform and as an educational tool for expanding access to two-photon lithography.

Fields of Study & Subjects

Nonlinear Optical Materials Studies Advanced Fluorescence Microscopy Techniques Laser Material Processing Techniques

Publication details

Journal / source
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
Pages
11–11
Publication date
4 March 2026
Language
EN