Optical emission spectral analysis using FastICA for diagnosing wafer edge uniformity in plasma etching

2026

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Authors: Junsik Choi, Sanghee Han, Eunchong Park, Jaehyeon Kim, H.J. Choi, Youngju Ko, In-Joong Kim, Sung-Il Cho, Young Wan Kim, Heeyeop Chae

DOI: 10.1117/12.3080074

Cited by: 0

Fields of Study & Subjects

Plasma Diagnostics and Applications Laser-induced spectroscopy and plasma Plasma Applications and Diagnostics