Wafer-scale fabrication of silicon passive components using UV-nanoimprint lithography

2026

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Authors: Yuki Nakayama, Shu Nagamatsu, Gai Ichisawa, Towa Maekawa, Risako Mori, Takahiro Asai, Yasushi Fujii, Dai Shiota, Kazuto Oonou, Daiji Tanabe, Tomohiro Amemiya
DOI: 10.1117/12.3080361
Cited by: 0

Fields of Study & Subjects

Nanofabrication and Lithography Techniques Photonic and Optical Devices Advancements in Photolithography Techniques

Publication details

Pages
42–42
Publication date
16 January 2026