In-situ quality prediction and process parameter optimization of laser-assisted deposition for transparent conductive oxide nanoscale thin film deposition

In this study, we developed technology for in-situ prediction of electrical resistances for transparent conductive oxide (TCO) thin films during the fabrication process. The Laser-Assisted Atmospheric Plasma Jet (L-APPJ) process was employed to simultaneously deposit and pattern Gallium-doped Zinc Oxide (GZO) in an ambient pressure environment. A prediction model that accurately correlates the Ultraviolet (UV) transmittance spectrum of the thin film with the electrical conductivity was developed by applying the Complex System Response (CSR) methodology. An error of approximately 4% between the predicted electrical resistance and the experimental results was achieved. The resulting correlation shows a good fitting R2 of 0.82. It is demonstrated that the developed in-situ UV transmittance analysis technique can be applied as an effective real-time non-contact resistance measurement during the fabrication process. By integrating the CSR method with the UV transmittance to the electrical resistance prediction model, a rapid non-contact parameter optimization during the L-APPJ process can be achieved.