Direct laser writing of metallic material with submicron linewidths using laser-assisted chemical vapor deposition

Direct laser writing of metals allows for mask-less printing of metallic lines. This method of laser assisted pyrolytic (or photothermal) deposition allows reactants accessible to conventional chemical vapor deposition (CVD) to be used for patterning of thin and submicron structures. Using sublimated ferrocene as a precursor, iron lines are printed under low-vacuum conditions. The precursor is flowed continuously through the printing area, through which a laser beam is focused by a high numerical aperture (NA) microscope objective lens. The printed submicron metallic lines show promise for applications in printed microelectronics.