Laboratory-scale quantitative actinic EUV platform for photoresist evaluation

Metrology, Inspection, and Process Control XXXVI 2026

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Authors: Hyuk Jin Kim, Geonhwa Kim, Namhyun Kim, Boknam Chae, Dong Gun Lee, Byung Gook Kim, Jin-Kyun Lee, Jiho Kim, Sangsul Lee
DOI: 10.1117/12.3090012
Cited by: 0
References: 7

Fields of Study & Subjects

Advancements in Photolithography Techniques Advanced X-ray Imaging Techniques Photopolymerization techniques and applications

Publication details

Journal / source
Metrology, Inspection, and Process Control XXXVI
Pages
126–126
Publication date
23 February 2026
Language
EN