An online wavefront aberration detection method for projected lithography based on Hartmann wavefront measurement sensors

The objective lens of projection lithography is the most difficult to develop, has the highest research and development cost, and is the most core part of the lithography machine, which performance determines the upper limit of the entire lithography machine. During the integration and use of photolithography objective lenses, due to the existence of influences such as integration deviation and exposure heat accumulation, the state of the integrated photolithography objective lens may be inconsistent with the offline detection state. Thus, an online wavefront aberration measurement method is required to evaluate their performance in real time.