First 1000 W in-band EUV power demonstration using laser-produced plasma technology

Optical and EUV Nanolithography XXXIX 2026

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Authors: Haining Wang, Elio G. Champenois, Ben Kamerin, Kirk Post, Jeroen F. M. Keeris, Michael Purvis, Jayson Stewart, Spencer D. Rich, Klaus Hummler, Qiushi Zhu, Andrew LaForge, Peter Mayer
+4 more Dustin M. Urone, Yue Ma, Bob Rollinger, Alexander A. Schafgans
DOI: 10.1117/12.3090469
Cited by: 1

Fields of Study & Subjects

Laser-Plasma Interactions and Diagnostics Vacuum and Plasma Arcs Silicon and Solar Cell Technologies

Publication details

Journal / source
Optical and EUV Nanolithography XXXIX
Publisher
SPIE
Pages
18–18
Publication date
9 April 2026