Occlusion-aware pattern measurement for see-through BSE images of HV-SEM via contour- and pixel-based approaches

Metrology, Inspection, and Process Control XXXVI 2026

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Authors: Shinji Murakami, Yoshihiro Midoh, Masahiro Oya, Yosuke Okamoto, Shinichi Nakazawa, Kotaro Maruyama, Yuichiro Yamazaki, Noriyuki Miura

DOI: 10.1117/12.3090614

Cited by: 0

References: 13

Fields of Study & Subjects

Electron and X-Ray Spectroscopy Techniques Advanced Electron Microscopy Techniques and Applications Image Processing Techniques and Applications

References 13