Application of low landing energy e-beam metrology for evaluating ArF immersion photoresist: Insights from EUV PR methodologies

Metrology, Inspection, and Process Control XXXVI 2026

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Authors: Min Woo Kang, Youjoung Jun, Wonkyeong Jeong, Hyunsu Kim, Eunkyeong Jang, Sangyun Lee, Cheonji Lee, Gwangseob Lim, Kyuyoung Kim, Daiyoung Mun, Shachaf Tsafriri, Yana Branzburg
+8 more Yuval Shelef, Rajat Arora, Yoav Harari, You Jin Kim, Jeongho Yeo, Sujin Lim, Woosung Jung, Chan Hee Kwak
DOI: 10.1117/12.3090778
Cited by: 0
References: 5

Fields of Study & Subjects

Advancements in Photolithography Techniques Electron and X-Ray Spectroscopy Techniques Particle Detector Development and Performance

Publication details

Journal / source
Metrology, Inspection, and Process Control XXXVI
Pages
144–144
Publication date
10 March 2026
Language
EN