NIL process integration toward HP 1X nm generation

Novel Patterning Technologies 2026 2026

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Authors: Kenta Suzuki, Ryosuke Hamamoto, Yôko Tanaka, Tetsuya Ueda, Wataru Mizubayashi, Yoshihiro Hayashi, Masaki Ishida, Tomomi Funayoshi, Hiromi Hiura, Masayuki Kagawa, Noriyasu Hasegawa, Kiyohito Yamamoto
DOI: 10.1117/12.3091095
Cited by: 1

Fields of Study & Subjects

Integrated Circuits and Semiconductor Failure Analysis Radiation Effects in Electronics Advancements in Photolithography Techniques

Publication details

Journal / source
Novel Patterning Technologies 2026
Publisher
SPIE
Pages
20–20
Publication date
8 April 2026